ASEPS: Simulation of the Breakdown Behavior of Power Transistors

Introduction

ASEPS is a Fortran-based simulator for determining the breakdown behavior of power transistors. To this end, it is necessary to compute the strength of the electromagnetic fields that are being built up inside the device. This requires the numerical solution of the Maxwell equations throughout the device structure.

An exact solution of the Maxwell equations is computationally expensive. However, if we are only interested in analyzing the behavior of the diodes under reverse bias condition, the Maxwell equations can be simplified, whereby an accurate solution can be obtained about 100 times faster.

These simplifications were realized in ASEPS, so that also larger device structures, e.g. multiple transistors with a common substrate, can be simulated efficiently.

When power transistors are exposed to total dose ionizing radiation, e.g. during long space missions or under the influence of the electromagnetic pulse (EMP) after exploding an atomic bomb in the atmosphere, they are being destroyed, as electromagnetic fields can locally be built up that the device is unable to withstand. To counter this problem, it is necessary to harden the transistors against the effects of total dose ionizing radiation by embedding them in a suitable termination structure. ASEPS is well suited for the simulation of such termination structures.

As the computers became more powerful, the savings that ASEPS made possible became less important. It became possible, to simulate also larger device structures with general-purpose device simulators, such as the Pisces simulator developed by Stanford University, within reasonable time limits. For this reason, we stopped with the further development of ASEPS in the early ninties.


Historical Development


Most Important Publications

  1. Wu, Q.M., and F.E. Cellier (1986), Simulation of High-Voltage Bipolar Devices in the Neighborhood of Breakdown, Mathematics and Computers in Simulation, 28, pp.271-284.

  2. Wu, Q.M., C.M. Yen, and F.E. Cellier (1989), Analysis of Breakdown Phenomena in High-Voltage Bipolar Devices, Transactions of SCS, 6(1), pp.43-60.

  3. Davis, K.R., R.D. Schrimpf, F.E. Cellier, K.F. Galloway, D.I. Burton, and C.F. Wheatley, Jr. (1989), The Effects of Ionizing Radiation on Power-MOSFET Termination Structures, IEEE Trans. Nuclear Science, 36(6), pp.2104-2109.

  4. Kosier, S.L., R.D. Schrimpf, F.E. Cellier, and K.F. Galloway (1990), The Effects of Ionizing Radiation on the Breakdown Voltage of P-Channel Power MOSFETs, IEEE Trans. Nuclear Science, 37(6), pp.2076-2082.

  5. Kosier, S.L., R.D. Schrimpf, K.F. Galloway, and F.E. Cellier (1991), Predicting Worst-Case Charge Buildup in Power-Device Field Oxides, IEEE Trans. Nuclear Science, 38(6), pp.1383-1390.

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Last modified: January 22, 2006 -- © François Cellier